Angular ellipsometric measurements of thin Ag, Cu films covered by HfO2 protective layer were performed. The ellipsometric parameters <$Epsi> and <$EDELTA> were measured in <$Etheta~=~43~-~85 symbol Р> light incidence angle range, where <$Epsi> is the azimuth of restored linear polarization, <$EDELTA> is the phase shift between p- and s-components of reflected light. For comparison, thin Au film (traditional sensor for surface plasmon resonance (SPR)) was examined as well. The curve <$EDELTA ( theta )> for all the samples investigated falls down with increasing angle of light incidence, while <$Epsi ( theta )> changes relatively weakly. It has been ascertained that the increase in the thickness of HfO2 layer affects the tan(<$Epsi>) value, while tan(<$Epsi>) deviation is mainly determined by the type of metallic film. With the growth of HfO2 layer, the minimum position of tan(<$Epsi>) shifts to smaller angles. From these angular dependences, one could choose the appropriate SPR-compatible structure due to maximal deviation of tan(<$Epsi>). To optimize layer thickness for a high SPR-response, spectral measurements and additional calculations are required.

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